SiPhotonIC has developed its proprietary 300SIN platform, available for 1550nm and 1300nm for all compatible applications.

The process is supported by a complete Process Design Kit (PDK) under the xPDK format available for both proprietary and open-source suites (Luceda, Synopsys, KLayout, GDS Factory, NAZCA, L-edit, GdsPy).
The xPDK package includes the necessary material to launch the tape out right away (i.e. design manuals, DRC rules & decks and reference designs) and can be obtained after registering and signing an NDA.

The SIN nano-fabrication service is available both as an on-demand service and through scheduled MPW runs. We support a wide range of production volumes, from small quantities of PICs to full wafer batches.

To obtain the PDK and relevant design material, register through “ACCESS“.

The standard 300SIN platform offers the following building blocks to use for passive operation:

• • • Spot size converters
    • Vertical grating couplers (focusing and long taper)
    • Vertical 2D grating couplers for polarization splitting
    • Crosses
    • Directional couplers and Y-splitters
    • MMIs
    • Thermo-optic phase shifters (*available soon)

Standard SIN delivery times (for on-demand runs, for MPWs refer to each MPW schedule)

• • • Passives: 1.5 month FRO (1 month with rapid cycle premium)
    • Passives – T/O phase shifters: 2.5 months FRO (2 months with rapid cycle premium)

 SiPhotonIC offers the following advanced processes for the SIN platform, which can be accessed on-demand:

• • • Advanced process I: Introduction of thermo-optic elements for phase shifting
    • Advanced process II: SIN suspension for in-chip elements (ring resonators) and edge elements (i.e. spot size converters).

Advanced SIN delivery times (for on-demand runs)

• • • SIN with T/O phase shifters: 2.5 months FRO (2 months with rapid cycle premium)
    • SIN suspension: 2.5 months FRO (2 months with rapid cycle premium)

SiPhotonIC also offers fully-customized SIN photonic stacks tailored to your specific R&D requirements.

Whether you need modifications on the standard 300SIN platforms or to develop a completely new SIN stack, we provide the flexibility to adapt materials, layer structures and process parameters according to your application with maximum design freedom. The following options are available (examples below):

• • • Custom process I: There is the possibility to processing any custom nitride thickness between 100-800nm on our substrates or customer’s substrates with well verified recipes. 
    • Custom process II: Processing custom thickness Silicon Nitride-on-Si
      

Custom SIN delivery times (for on-demand runs)

• • •  Contact us for project-specific delivery estimates

Gain early access to the advanced SIN developments. You can experiment by joining one of our on-going development runs and benefit from accessing cutting edge technology with competitive pricing. Get in contact with us to learn more about our developments.