Rapid Prototyping of Photonic ICs

SiPhotonIC is a high-tech photonic foundry specializing in the rapid prototyping of Photonic Integrated Circuits (PICs) across multiple material platforms, including Silicon-on-Insulator (SOI), Silicon Nitride (SiN), Silicon Nitride-on-Silicon (SiN-on-Si), Thin-Film Lithium Niobate (TFLN), as well as developing your fully custom photonic stack.

The company delivers high-quality PIC fabrication services with strong emphasis on speed, flexibility, and precision, offering:

Fast-turnaround fabrication services including:

• • • On-demand prototyping runs (typically 1–3 months) enabling fast iteration cycles
    • Multi-Project Wafer (MPW) runs (typically 3–4 months) for shared wafer fabrication

Mature photonic technology platforms, supported by ready-to-use Process Design Kits (PDKs) that allow designers to start their IC development immediately

High-precision manufacturing with continuous quality verification using SEM and optical microscopy at all key fabrication stages

Great volume flexibility with the option to tape out a few PICs up to wafer batches

A broad range of lithography, deposition, and etching technologies are offered, allowing maximum design flexibility. Key lithography capabilities include:

• • • Electron Beam Lithography (EBL) for ultra-high-resolution patterning (>30 nm feature sizes) suitable for advanced, fine-structure designs
    • Deep Ultraviolet (DUV) Lithography for high-throughput batch fabrication of designs requiring >200 nm feature sizes
    • Hybrid EBL + DUV Lithography, combining high-volume manufacturing with localized ultra-high-resolution patterning (<20 nm features)
    • Maskless UV Lithography for rapid and flexible patterning of micron-scale structures with relaxed resolution requirements